This system is ideal for device and process prototyping and pre-production at the 32nm node and beyond..		The Imprio HD2200 is the first system to enable both development and pilot-production of patterned media applications.
This mid-level system is ideally suited for use in small scale manufacturing facilities, corporate R&D centers, and government laboratories exploring nano-device fabrication.		The Imprio 1100 represents the next generation in fully automated nano-imprint lithography; combining the resolution and CD control of e-beam with the throughput of a mask aligner.
This affordable, research-oriented nano-imprinter is for universities and small laboratories. It is specifically targeted towards researchers studying basic science in the area of nanotechnology.